Atomic Layer Deposition

Veeco is the leading ALD supplier to academic institutions and industrial customers worldwide, with over 530 ALD systems shipped for R&D and production. 

The Savannah® Thermal and Fiji® Plasma systems are the ALD platforms of choice for R&D and have been cited in more than 2,000 peer-reviewed academic papers.

For fully automated industrial solutions for high-volume manufacturing (HVM) ALD combine lowest cost-of-ownership, superior throughput, and the highest standards of quality, the new Firebird™ HVM and proven Phoenix® platform is tailored to meet specific customer needs in terms of ALD process performance, wafer handling and throughput as well as flexible thermal management.


Savannah® has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade.


Fiji® series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The result is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.


The Firebird™ system is a fully automated batch production ALD platform delivering superb uniformity with best-in-class throughput at the lowest possible cost-per-wafer. Integrating proven Veeco automation solutions, it enables safe wafer handling via low-impact batch transfer.


The Phoenix® system is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to industrial-grade manufacturing. Technologists and researchers rely on the Phoenix® for repeatable, highly accurate film deposition on flat and 3D substrates alike.