Ellipsometry is a non-destructive thin film characterisation technique widely used to determine thin film thickness at Angstrom resolution and optical constants (n,k). This optical technique enables accurate characterisation of surfaces and interfaces, and is ideal for nano and micro layer measurement. Thin film applications are used in semiconductor, photovoltaic, optolectronic, optical and functional coating, surface chemistry and biotechnology.
Thin Film Metrology
- Spectroscopic ellipsometer
- In-Situ ellipsometer
- Fully automated ellipsometer
- Large area metrology platform
UVISEL Spectroscopic Ellipsometer
UVISEL - Spectroscopic Ellipsometer from VUV to NIR High End Research Ellipsometer Spectroscopic Phase Modulated Ellipsometer Highest precision and sensitivity Wide spectral range : 142 to 2100 nm Modular design Fully integrated spectroscopic...