Ellipsometry is a non-destructive thin film characterisation technique widely used to determine thin film thickness at Angstrom resolution and optical constants (n,k). This optical technique enables accurate characterisation of surfaces and interfaces, and is ideal for nano and micro layer measurement. Thin film applications are used in semiconductor, photovoltaic, optolectronic, optical and functional coating, surface chemistry and biotechnology. 

Thin Film Metrology

  • Spectroscopic ellipsometer
  • In-Situ ellipsometer
  • Fully automated ellipsometer
  • Large area metrology platform 

Auto SE Spectroscopic Ellipsometer

The Auto SE is a new thin film measurement tool that allows full automatic analysis of thin film samples with simple push button operation. Sample analysis takes only a few seconds and provides...

Smart SE Spectroscopic Ellipsometer

The Smart SE from HORIBA Scientific is a powerful, versatile and cost effective spectroscopic ellipsometer for *fast and accurate thin film measurements*. It characterises thin film thickness from a few Angstroms to 20µm,...

UVISEL Spectroscopic Ellipsometer

UVISEL - Spectroscopic Ellipsometer from VUV to NIR High End Research Ellipsometer Spectroscopic Phase Modulated Ellipsometer Highest precision and sensitivity Wide spectral range : 142 to 2100 nm Modular design Fully integrated spectroscopic...


The UVISEL 2 includes the widest range of integrated automated features useful for the investigation of all material family.It features a patented sample vision coupled with automated spot selection for accurate positioning of the...