GD-OES

Pulsed RF GD-OES is the only technique that can provide both surface, depth profile and bulk composition, and with high sensitivity to all elements (including the gaseous elements), for almost all solid materials, including metals, metal alloy coatings, semiconductors, polymer coatings, glass, etc.

It relies on the controlled sputtering of a representative area of the material of interest and the simultaneous detection of the sputtered species. As an analytical technique it nicely complements XPS and SEM.

GD-Profiler HR

1.0 meter simultaneous spectrometer for bulk and depth profile analysis of conductive and non-conductive samples. 64 analytical channels. Fast, simultaneous analysis of solid samples for industrial control of Steels, Cast Iron and metal alloys...

GD-Profiler 2

RF-Only generator is Class E standard and optimized for stability and crater shape allowing for real surface analysis. Source can be pulsed with synchronized acquisition for optimum results on fragile samples. The...

Plasma Profiling TOFMS

The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend...