Pulsed RF GD-OES is the only technique that can provide both surface, depth profile and bulk composition, and with high sensitivity to all elements (including the gaseous elements), for almost all solid materials, including metals, metal alloy coatings, semiconductors, polymer coatings, glass, etc.

It relies on the controlled sputtering of a representative area of the material of interest and the simultaneous detection of the sputtered species. As an analytical technique it nicely complements XPS and SEM.


Chris Bradburn
Chris Bradburn
Business Development & Marketing Manager
Puh.: +46 (0)18-56 68 09
Mobile: +46 (0)70-396 18 88

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